Sputtering Systems
Since inception in 1991, we have built and refurbished a range of thin film deposition systems for a wide range of industries around the world. Our in-depth knowledge and understanding of the vacuum and plasma processes has led us to developed a range of standard and bespoke deposition systems can be modified to our clients exact requirements.
Our skilled engineers offer advice on design and build to process development, ensuring the deposition process and product carrier are customised to meet your exact requirements.
Our solutions focus on increasing your production throughput by system reliability and quality of product.
When existing systems are refurbished, we ensure they meet all current safety standards.
Sputtering is the ideal method to deposit stoichiometric conformal coatings. Widely used in the semiconductor and electronics industry. Our systems are ideal for coating a wide range of substrates including silicon, glass and plastics.
Our deep heritage in Sputtering systems has led us to design a number of our own standard batch designs, R&D systems and bespoke units developed for a number of specific needs.
Standard Systems
Our standard Sputtering systems range from 2-8 cathodes and from 1” round to 18” rectangular, with the option of larger target areas upon request.
All the systems we produce as standard will have a load-lock.
We can offer etch facilities either in main chamber or load-lock.
Upgrade Performance
At our build and test facility in Cambridgeshire, we have upgraded and maintained a number of third party systems from MRC & KDF to ensure improved performance and an extended life cycle of the machine.
Industries
Over the years we have worked with a variety of clients from a number of industries including: semiconductor, space, optical, automotive, aerospace, military, nuclear, pharmaceutical, renewable energy, fusion, research & development.
